Description
Product Name : Dichlorosilane DCS SiH2Cl2 99.99 % Precursor
CAS :4109-96-0
Purity: 4N
Product specifications: 2 gal /4 gal /10 gal /….as per demand
Product form: Dichlorosilane DCS SiH2Cl2 99.99 % Precursor
Main use: it is mixed with ammonia (NH3) in LPCVD chambers to grow silicon nitride in semiconductor processing.
Availability : In Stock
What is Dichlorosilane DCS ?
Dichlorosilane, or DCS as it is commonly known, is a chemical compound with the formula H2SiCl2. In its major use, it is mixed with ammonia (NH3) in LPCVD chambers to grow silicon nitride in semiconductor processing.
Certificate of Analysis
| Component | Unit | Specification |
| SiH₂Cl₂ | % | ≥ 99.99% |
| H₂ | ppm | ≤ 10 |
| O₂/Ar | ppm | ≤ 1 |
| N₂ | ppm | ≤ 0.5 |
| CO | ppm | ≤ 0.5 |
| CH₄ | ppm | ≤ 1 |
| CO₂ | ppm | ≤ 0.5 |
| SiH₃Cl | ppm | ≤ 20 |
| SiHCl₃ | ppm | ≤ 20 |
| SiCl₄ | ppm | ≤ 20 |
| HCl | ppm | ≤ 0.1 |
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What are applications of Dichlorosilane DCS ?
Dichlorosilane, or DCS as it is commonly known, is a chemical compound with the formula H2SiCl2. In its major use, it is mixed with ammonia (NH3) in LPCVD chambers to grow silicon nitride in semiconductor processing. A higher concentration of DCS·NH3 (i.e. 16:1), usually results in lower stress nitride films.
● SiH2CL2 is silicon precursor gas used in combination with ammonia for silicon nitride chemical vapor deposition ( CVD ).
● Also used for epitaxial silicon deposition .
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