XeF2 Vapor Phase Etching: Why High-Selectivity Silicon Removal Transforms Semiconductor Manufacturing BY Tao, Published Jan 3, 2026 Introduction: The Unseen Revolution in Chip Fabrication Over the past 3 years, China Isotope Development Co Ltd was starting to supply Xenon Difluoride (XeF₂) to China domestic clients, I have observed that true breakthroughs in semiconductor manufacturing…
Advanced Xenon Difluoride Applications: From MEMS Device Release to IC Failure Analysis BY Tao, Published Jan 3, 2026 Introduction: A “Small” Gas with outsized impact In the world of semiconductor and MEMS manufacturing, the tools that really change the game are often not the ones that make headlines. One of the best examples…
Xenon Difluoride XeF₂ Selectivity: How Xenon Difluoride Achieves Precision Etching Without Damaging Microstructures BY Tao, Published Jan 3, 2026 In the intricate, nanometer-scale world of semiconductor manufacturing and Micro-Electro-Mechanical Systems (MEMS), the ability to remove material is commonplace. We have dozens of ways to blast, dissolve, or erode silicon. However, the true art…
Xenon Difluoride in Semiconductor Chip Repair: A Precision Tool for Nanoscale Circuit Modification BY Tao, Published Jan 3, 2026 Introduction: The High-Stakes World of Nanoscale Surgery In the semiconductor industry, the margin for error is measured in atoms. As we push logic nodes toward 5nm, 3nm, and the Angstrom era, the complexity of Integrated…
Xenon Difluoride (XeF₂) in MEMS Fabrication: The Gold Standard for Sacrificial Layer Release Etching BY Tao, Published Jan 2, 2026 Introduction: Revolutionizing Microelectromechanical Systems with XeF2 Xenon Difluoride (XeF2) is a chemical compound composed of xenon and fluorine, represented by the formula XeF2. Among all fluorides, Xenon Difluoride (XeF₂) stands out as a cornerstone in…
