Description
Product Name: Xenon Difluoride XeF2 Gas
CAS: 13709-61-0
Purity: 99.99 %~ 99.999 %
Product specifications: 4L/8L/10L/40L/47L/50L & PTFE Bottle
Product form: Xenon Difluoride XeF2
Main use: Xenon Difluoride XeF2 can be used in the production of specialty chemicals and as a fluorinating agent.
Certificate of Analysis
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ANALYSIS RESULT |
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| Analysis Item | Standard Damend | Analysis Result |
| XeF2 Purity % | ≥ 99.99 | 99.994 |
| AI mg/kg | ≤ 5 | 2.1 |
| Ca mg/kg | ≤ 1 | 0.3 |
| Cr mg/kg | ≤ 30 | 19.2 |
| Co mg/kg | ≤ 1 | 0.3 |
| Cu mg/kg | ≤ 1 | 0.4 |
| Fe mg/kg | ≤ 20 | 14.9 |
| Li mg/kg | ≤ 1 | 0.1 |
| Mg mg/kg | ≤ 1 | 0.2 |
| Mn mg/kg | ≤ 8 | 1.6 |
| Mo mg/kg | ≤ 10 | 2.2 |
| Ni mg/kg | ≤ 20 | 13.2 |
| K mg/kg | ≤ 1 | 0.2 |
| Na mg/kg | ≤ 1 | 0.2 |
| Total Impurity mg/kg | ≤ 100 | 54.9 |
NOTE : For Xenon difluoride (XeF2) grade 99.999 %, Please call or contact us tao.hu@asiaisotope.com for more technical details.
Our Xenon difluoride (XeF2) serve MEMS and Chemical Synthesis for several years , gaining their trust ranging from its quality / price / delivery. We know how they think when each inquiries, and solve their questions on site.
Xenon difluoride (XeF2) is a versatile compound with applications in various fields, including microfabrication, materials science, and chemical synthesis. Xenon difluoride (XeF2) is a strong fluorinating and oxidizing agent, making it useful for etching silicon in MEMS (Micro-Electro-Mechanical Systems) and for selectively fluorinating heteroatoms in organometallic compounds.
Applications and Industries
1. MEMS Fabrication:
Xenon difluoride (XeF2) is a key etchant in the production of MEMS devices.
Xenon difluoride (XeF2) is used to release moving parts in MEMS by etching away sacrificial layers. The etching process is isotropic and can be highly selective, meaning it etches silicon (and other materials like Mo and Ge) but not the masking materials like photoresist, SiO2, or Al.
This allows for the creation of complex microstructures with features like membranes, micro-bridges, cantilevers, and cavities.
The dry etching process with XeF2 avoids stiction issues often encountered with wet etching.
2. Chemical Synthesis:
Xenon difluoride (XeF2) is a powerful fluorinating agent, particularly useful for introducing fluorine into organic and organometallic compounds.
Xenon difluoride (XeF2) can selectively fluorinate heteroatoms in organometallic compounds without affecting alkyl or aryl groups.
Xenon difluoride (XeF2) is also used in Hunsdiecker-type reactions to generate radical intermediates and transfer fluorine.
Xenon difluoride (XeF2) can oxidize iodine to periodate, making it useful for detecting trace amounts of iodine and iodide.
Xenon difluoride (XeF2) can be used to prepare N-fluoroammonium salts, which are useful fluorinating reagents.
