Innovations in WF6 Delivery and Containment: Reducing Residuals, Leakage, and Cross-Contamination

Innovations in WF6 Delivery and Containment: Reducing Residuals, Leakage, and Cross-Contamination BY Tao, Published Sep 2, 2025 Introduction Tungsten hexafluoride (WF6) is a cornerstone of the semiconductor industry, valued for its role in chemical vapor deposition (CVD) processes to create low-resistivity tungsten films used in metallic interconnects. Its unique properties—high density, toxicity, and corrosiveness—make it…

WF6 Benchmarking for Advanced Thin-Film Deposition: Purity, Stability, and Process Windows

WF6 Benchmarking for Advanced Thin-Film Deposition: Purity, Stability, and Process Windows BY Tao, Published August 28, 2025 Introduction With over 30 years of expertise in specialty gases, I’ve seen how compounds like tungsten hexafluoride (WF6) have become indispensable in shaping advanced manufacturing technologies. As a high-purity gas, WF6 is a cornerstone in thin-film deposition for…