Description
Product Name : Trimethylaluminium TMA 99.999 % ~ 99.9999 % Precursor
CAS :75-24-1
Purity: 5N~6N
Product specifications: 500 L
Product form: Trimethylaluminium TMA 99.999 % ~ 99.9999 % Precursor
Main use: a widely used precursor in the chemical vapor deposition (CVD) process to produce thin films in various applications.
Availability : In Stock
What is Trimethylaluminium (TMA) ?
Trimethylaluminium (TMA) is one of the simplest examples of an organoaluminium compound. It is a widely used precursor in the chemical vapor deposition (CVD) process to produce thin films in various applications.
Certificate of Analysis
| Component | Unit | Spec. | |
| Ag | ppm | ≤1 | |
| As | ppm | ≤1 | |
| Ba | ppm | ≤1 | |
| Be | ppm | ≤1 | |
| Ca | ppm | ≤1 | |
| Cd | ppm | <0.2 | |
| Co | ppm | ≤1 | |
| Cr | ppm | ≤1 | |
| Cu | ppm | ≤1 | |
| Fe | ppm | ≤1 | |
| Hg | ppm | <0.1 | |
| Ge | ppm | ≤1 | |
| K | ppm | <0.2 | |
| Li | ppm | <0.05 | |
| Mg | ppm | ≤1 | |
| Mn | ppm | ≤1 | |
| Na | ppm | ≤3 | |
| Ni | ppm | ≤2 | |
| Pb | ppm | ≤2 | |
| S | ppm | ≤1 | |
| Si | ppm | ≤20 | |
| Sr | ppm | <0.05 | |
| Ta | ppm | 0.23 | |
| Ti | ppm | ≤1 | |
| V | ppm | ≤1 | |
| W | ppm | <0.2 | |
| Zn | ppm | ≤1 | |
| Total Oxygen | ppm | <10 | |
NOTE : For other grade 99.9999 % (6N) , don’t hesitate to call or contact tao.hu@asiaisotope.com for more technical details.
We are profressional to offer Trimethylaluminium (TMA) gas to the market over the past years, gaining their trust ranging from its quality / price / delivery. We know each parameters of product, to solve their questions on site , and pursuit to continue serving clients better.
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What are applications of Trimethylaluminium (TMA) ?
Trimethylaluminum is used for Al₂O₃ passivation, high-k film deposition, and compound semiconductor formation in ALD and MOCVD processes.
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