Description
Product Name: Hexafluorotungsten Tungsten hexafluoride WF6 Gas
CAS: 7783-82-6
Purity: 99.999 %
Product specifications: 4L/8L/10L/40L/47L/50L
Product form: Hexafluorotungsten Tungsten hexafluoride WF6 Gas
Main use: Used in the doping of semiconductors.
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Applications and Industries
Tungsten hexafluoride (WF6) is primarily used in the electronics industry, specifically for chemical vapor deposition (CVD) to create thin tungsten films on semiconductor wafers. These films act as conductive interconnects, forming electrical connections within integrated circuits. Additionally, WF6 is used in the production of tungsten carbide and as a heavy gas for controlling gas reactions.
1. Semiconductor Manufacturing:
Chemical Vapor Deposition (CVD): WF6 is a key precursor in CVD processes, where it decomposes to deposit a tungsten layer on substrates.
Conductive Interconnects: The tungsten deposited from WF6 forms low-resistance electrical pathways (interconnects) within semiconductor devices, connecting different components.
Dielectric Etching: WF6 can be used for selective etching of materials like silicon dioxide in semiconductor manufacturing.
2. Other Uses:
Tungsten Carbide Production: WF6 can be used in the production of tungsten carbide, a very hard material used in cutting tools and other industrial applications.
Controlling Gas Reactions: As a very dense gas, WF6 can be used to slow down or modify chemical reactions, for example, by reducing the temperature of a flame.
Potential Medical Applications: Some research suggests potential applications in medical imaging and treatment due to tungsten’s properties
