Description
Product Name: Carbon Tetrafluoride CF4 Gas
CAS: 75-73-0
Purity: 99.999 %
Product specifications: 4L/8L/10L/40L/47L/50L
Product form: Carbon Tetrafluoride CF4 Gas
Main use: Carbon Tetrafluoride (CF4): Used in plasma etching and as a refrigerant.
Availability : In Stock
What is Carbon Tetrafluoride ( CF4 ) ?
Tetrafluoromethane (CF4), also known as perfluoromethane, is a colorless, nonflammable, and nontoxic gas. It is chemically inert and has a moderately high global warming potential (GWP = 6,630; Greenhouse gas protocol, Fifth Assessment Report AR5).
Tetrafluoromethane is very stable and has a long atmospheric lifetime of 50,000 years. Although structurally similar to chlorofluorocarbons, tetrafluoromethane does not deplete the ozone layer. This is because the depletion is caused by the chlorine atoms in CFCs, which dissociate when struck by UV radiation. Carbon-fluorine bonds are stronger and less likely to dissociate. It is used as an important component in some ultra-low temperature refrigeration systems and also as a reactive ion etching gas in semiconductor materials processing applications.
Certificate of Analysis
| Component | Unit | Specification |
| CF4 | % | ≥99.9995 |
| O2+Ar | ppm | ＜1.00 |
| N2 | ppm | ＜2.00 |
| H2 | ppm | ＜0.30 |
| CO | ppm | ＜0.30 |
| CO2 | ppm | ＜0.30 |
| SF6 | ppm | ＜0.30 |
| THC (CH4、C2H4、C2H6) |
ppm | ＜0.30 |
| CHF3 | ppm | ＜0.30 |
| OFC (C2F6、CH2F2、C3F8) |
ppm | ＜1.00 |
| H2O | ppm | ＜1.00 |
| Acidity as HF | ppm | ＜0.10 |
| Total Impurity Content | ppm | ≤5.00 |
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What are the other applications of Carbon tetrafluoride (CF4) ?
Carbon tetrafluoride (CF4), also known as tetrafluoromethane, is a versatile compound primarily used in the semiconductor industry for etching and cleaning processes. It’s also used as a refrigerant and in other niche applications.
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Plasma Etching:
CF4 is widely used as a plasma etchant, particularly for silicon, silicon dioxide, and silicon nitride thin films. This process is crucial in the fabrication of microelectronics and integrated circuits.
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Chamber Cleaning:
CF4 plasma is used to clean vacuum chambers used in semiconductor manufacturing, removing residues and contaminants.
- Refrigerant: CF4 can be used as a cryogenic refrigerant, particularly in low-temperature applications.
- Neutron Detectors: CF4 is used as a counting gas in some types of neutron detectors.
- Gas Insulation: It can be used as a gas insulator in certain electrical applications.
- Leak Detection: CF4 is sometimes used as a leak detection agent.
- Spacecraft Attitude Control: In some spacecraft, CF4 is used for attitude control systems.
- Lubricants and Brake Fluids: It can be used as a component in some lubricants and brake fluids.
- Metal Smelting and Plastics: Due to its chemical stability, CF4 can be used in metal smelting and plastic industries
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